KESWANI, V. H. .; PESHWE, P. .; KESWANI, G. . An In-Depth Review of Models Used to Optimize Electron Beam Lithography Processes. International Journal of Intelligent Systems and Applications in Engineering, [S. l.], v. 12, n. 13s, p. 609 –, 2024. Disponível em: https://ijisae.org/index.php/IJISAE/article/view/4626. Acesso em: 22 jul. 2024.