Keswani VH, Peshwe P, Keswani G. An In-Depth Review of Models Used to Optimize Electron Beam Lithography Processes. Int J Intell Syst Appl Eng [Internet]. 2024 Jan. 29 [cited 2024 Jul. 22];12(13s):609 -. Available from: https://ijisae.org/index.php/IJISAE/article/view/4626