Deep Learning Based Image Denoising Model for Electronic Manufacturing Industry using NanuNet

Authors

  • Pankaj Kumar Sharma, Sandhya Sharma

Keywords:

Deep Learning, Artificial Intelligence, Image Denoising, Semiconductor wafer

Abstract

Recent advancement in technology has led the electronic manufacturing industry to be more efficient, robust and fast. The advent of Artificial Intelligence in various domains of engineering has brought many positive changes in production and testing. Since most of the work is based on electronic machines and apparatus in various fields, it is important to work on challenges in different steps of manufacturing and testing of such electronic equipments. Semiconductor wafers are the core and most important part in gadgets and apparatus thus testing and detection of any kind of defect present in the wafer is cardinal for better efficiency. For that it is customary to deal with the noise problem in PCB wafer images. In this paper we have proposed a deep learning based image denoising method for semiconductor wafer testing and noise removal.

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References

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Published

23.07.2024

How to Cite

Pankaj Kumar Sharma. (2024). Deep Learning Based Image Denoising Model for Electronic Manufacturing Industry using NanuNet. International Journal of Intelligent Systems and Applications in Engineering, 12(4), 1915–1920. Retrieved from https://ijisae.org/index.php/IJISAE/article/view/6510

Issue

Section

Research Article